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As wafer heating apparatus for holding a wafer, including a semiconductor wafer (hereinafter referred to as "wafer"), in such an atmosphere of the above gas and heating the wafer to a process temperature, a stainless heater incorporating a heating resistor therein has been used.
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4. Smooch your photoresist-covered wafer on dummy wafer while on hotplate. Make sure to align the flats. Use the big aluminum cooling block to smooch them evenly (use foil on top to protect wafers). 5. Use poly gloves for everything because the cool grease gets everywhere. 6. Leave block on wafer stack on hotplate for 5 min. 7.
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Resistance heated stem mounted aluminum susceptor assembly Abstract. In CVD processes susceptors can be made of a thermally conductive ceramic such as aluminum nitride which has superior durability with respect to fluorine plasma.
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